VSEE300 standalone VPD system

Rigaku's VSEE300 is an automated vapor phase decomposition (VPD) tool to decompose the surface of a Si wafer and concentrate contaminants in a droplet in preparation for TXRF, ICP-MS, or AAS analysis.

Features

• Minimum footprint
• High throughput
• Designed for chemical safety and ease of routine maintenance
• Fully automated operation (decomposition, droplet recovery, drying)
• Flexible VPD treatment parameters
• Whole wafer, ring, and fan scan types
• 150mm, 200mm, and 300mm wafer capable
• Ability to extract sample solution for ICP-MS and AAS analyses
• Ability to dry concentrated droplets for TXRF analysis
• VPD enables a 100-fold TXRF detection limit improvement