Optics for Reflectometry/Grazing incidence XRD
Grazing incidence X-ray diffraction (XRD) has become an increasing popular advanced method of characterizing materials. Reflectometry for thin film analysis is a common semiconductor application of this technique. Rigaku Max-Flux® optics provide significant advantages in these application and can be installed on any X-ray diffractometer using the Max-Flux Optical System.
Reflectometry is done by θ/2θ scans at very low angles. It is most commonly used to measure the thickness, roughness, density, and curvature of semiconductor wafers. In general, X-ray diffraction is the most versatile diffraction technique available to characterize thin layers and films. It allows the analysis of all the same parameters as reflectometry plus other capabilities such as: preferred orientation, composition, defect levels, topography, residual stress, pole figures, and reciprocal space maps.
For these applications, Rigaku Max-Flux optics provide significant advantages, including: increased flux, reduced divergence, improved counting statistics, decreased counting times, higher sample throughput, and enhanced angular range.
Please contact Rigaku to request a copy of the available application notes for reflectometry.
