EUV lithography
Extreme ultraviolet (EUV) lithography is truly a technology breakthrough for the semiconductor manufacturing and electronics industries. The 13.4 nm wavelength of this light is more than 10 times shorter than optical alternatives and thus allows patterning of chip features below 50 nm in size. Multilayer coating technology is one of several enabling technologies for EUV lithography. They serve to collect, shape and filter the EUV light to achieve a highly intense uniform beam. This beam then illuminates a reflection mask which consists of a patterned multilayer. The pattern is further reduced through multilayer coated imaging optics to achieve a previously unobtainable feature size within an integrated circuit chip.
Rigaku, a pioneer and world leader in designing and manufacturing high energy optics to solve semiconductor manufacturing challenges, has extensive expertise in providing unique solutions for EUV lithography development.
- Condenser optics
- Reflection masks
- Imaging optics
Solutions