Coatings
Every aspect of modern life benefits from coating or thin film technology. Whether a barrier layer film in an integrated circuit chip or a conversion coating on an aluminum beverage can, X-ray analytical techniques are integral to both R&D development, production process control and quality assurance. X-ray fluorescence (XRF) can determine the thickness and elemental composition of metallic coatings. Commonly employed in the semiconductor manufacturing process as a metrology tool, X-ray reflectometry (XRR) is used to measure layer thicknesses in a multi-layer stack of coatings and also can characterize other coating properties like roughness and interlayer diffusion. Emerging as a leading enabler for nano technology research, X-ray diffraction (XRD) and associated techniques are employed to examine the nature of the molecular structure of films. Rigaku technology and experience provide a variety of non-destructive analytical solutions for coating and thin film measurements.
Solutions
- Automated XRD and XRR: SmartLab®
- High-power θ/θ goniometer system: TTRAX III
- High-performance XRD and XRR: Ultima IV
- Benchtop analysis: MiniFlex™
- Low-cost XRF: Primini
- High-performance XRF: ZSX Primus, ZSX Primus II
- Semiconductor wafer metrology: MFM65, WaferX 300 and WDA-3640